Pulsed Laser Deposition System
Technical Details
- Spherical Chamber made of SS 304
- Size: 12” / 14” / 18”
- Ports for Pumping, View, Laser, Gas Inlet, Outlet, etc.,
- Substrate Heater capable of attaining 8000 C with Temp. Controller
- Substrate Rotation
- X, Y and Rotational Movement of Substrate Heater
- Magnetically Coupled Shutter Assembly
- Automated Target Carrousel with Controller
- Target turret with 6 target holders of 1” Dia.
- Vacuum Gauges with digital display unit
- Gate Valve
- Gas Flow Assembly with MFC and Valves
- Lens Holder attached to the Chamber with X,Y and Z movement of lens
- Vacuum Pumping System
- Support frame with caster wheels and lock pads
- Software to control and operate the Target Carrousel
Magnetron Sputtering System
Technical Details
- Chamber made of SS 304
- Ports for Pumping, View, Gas Inlet, Outlet, etc.,
- Substrate Heater capable of attaining 8000 C with Temp. Controller
- Substrate Rotation
- Magnetron Sputter Sources water cooled
- Geometry: Parallel (or) Confocal
- Vacuum Gauges with digital display unit
- Gate Valve
- Gas Flow Assembly with MFC and Valves
- Vacuum Pumping System
- Support frame with caster wheels and lock pads
Hot Filament CVD System
Technical Details
- Spherical Chamber
- Filament Assembly
- Filament Power Supply
- Ports for Pumping, Gas Inlet, Outlet, etc.,
- Substrate Heater with Temp. Controller
- Gas Flow Assembly with MFC and Valves
- Shower assembly for gas flow
- Vacuum Gauges with digital display unit
- Gate Valve
- Vacuum Pumping System
- Support frame with caster wheels and mobility
Evaporation System
Technical Details
- Chamber: “D” Shape (or) Box Type
- Electrode Assembly
- Ports for View, Pumping, Gas Inlet, Outlet, etc.,
- Substrate Heater with Temp. Controller
- Gas Flow Assembly with Control Needle Valve
- Vacuum Gauges with digital display unit
- Gate Valve
- Vacuum Pumping System
- Digital Thickness Monitor
- Support frame with caster wheels and mobility
Multiple Deposition System
Technical Details
- Chamber: Spherical (or)Cylindrical with Hinged door opening
- Electrode Assembly for Evaporation Technique
- Sputtering Sources for Sputtering Technique
- Ports for View, Pumping, Gas Inlet, Outlet, etc.,
- Substrate Heater with Temp. Controller
- Gas Flow Assembly with MFC and Valves
- Vacuum Gauges with digital display unit
- Gate Valve
- Vacuum Pumping System
- Digital Thickness Monitor
- Support frame with caster wheels and mobility
Chemical Vapor Deposition System
Technical Details
- Structure: Box (or) Cylindrical Horizontally mounted on Frame
- Number of Zones: Single / Two / Three
- Tube: Quartz &Size: 50 mm OD x 1.2 Mtr Long
- Max. Temperature: 11000 C
- Continuous Operating Temperature 10000 C
- Support Holders for Quart Tube
- Water Cooled End Flange on one end will have gas inlet
- Water Cooled End Flange on Other end will have
- Pumping port
- Arrangement for pull rod to remove sample insitu
- Shower assembly to cool the sample with inert gas
- Quick Access Door to remove sample
- Temp. Controllerfor hot zone
- Gas Flow Assembly with MFC and Valves
- Vacuum Gauges with digital display unit
- Rotary Vacuum Pumping System
- PID Programmable Water Chiller
- Support frame with caster wheels and mobility
- Automation of Gas Flow and Temperature with PC / Laptop: Optional
RF / DC Magnetron Sputtering Unit
Technical Details
- Spherical Chamber made of SS 304
- Ports for Pumping, View, Gas Inlet, Outlet, etc.,
- Water Cooled Magnetron Sputtering Sources: 04 Nos.
- Geometry:Confocal
- RF Power Supply with Auto matching network
- DC / Pulsed DC Power Supply
- Substrate Heater with Temp. Controller
- Substrate Rotation
- Vacuum Gauges with digital display unit
- Gate Valve
- Gas Flow Assembly with MFC and Valves
- Vacuum Pumping System
- Support frame with caster wheels and lock pads
Electron Beam Evaporation System
Technical Details
- Dual Chamber
- MOC: SS 304
- Ports for Pumping, View, Gas Inlet, Outlet, etc.,
- Electron Beam Source: 06 Pocket
- Solid State Power Supply for Electron Beam Source
- E Beam Deflection: 2700
- Motorized Sample Stage with Manual Tilting arrangement
- Vacuum Gauges with digital display unit
- Gate Valve
- Vacuum Pumping System
- Support frame with caster wheels and lock pads
Plasma Enhanced CVD System
Technical Details
- Spherical Chamber
- Electrode Assembly
- Ports for Pumping, Gas Inlet, Outlet, etc.,
- Power Supply: DC / RF
- Substrate Heater with Temp. Controller
- Gas Flow Assembly with MFC and Valves
- Shower assembly for gas flow
- Vacuum Gauges with digital display unit
- Gate Valve
- Vacuum Pumping System
- Support frame with caster wheels and mobility
